| 摘要 |
PROBLEM TO BE SOLVED: To provide a stripping liquid composition which easily strips a modified or hardened photoresist generated in a wet etching or dry etching process in the manufacturing processes of a semiconductor element or a liquid crystal display element, in a short period of time at low temperatures, causes no damage in a metal film material or an oxide film material in the lower part to be exposed, and is rinsed only with water without requiring use of an organic solvent. SOLUTION: The photoresist stripping liquid composition comprises deionized water, an organic amine compound, a glycol ether compound, a water-soluble organic solvent and a corrosion preventive. COPYRIGHT: (C)2005,JPO&NCIPI |
