发明名称 |
COMPOSITION FOR FORMING SILICA-BASED COATING FILM, MANUFACTURING METHOD FOR SILICA-BASED COATING FILM, AND ELECTRONIC PART |
摘要 |
PROBLEM TO BE SOLVED: To provide such a composition for forming a silica-based coating film as capable of forming a silica-based coating film which is excellent in the mechanical strength such as sufficient resistance to CMP, low dielectric properties and also adhesive properties. SOLUTION: The composition for forming the silica-based coating film comprises (a) component: a siloxane resin such as an alkoxy silane, (b) component: a solvent such as alcohols having capability of dissolving said siloxane resin, and (c) component: an onium salt such as an ammonium salt. COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2005042118(A) |
申请公布日期 |
2005.02.17 |
申请号 |
JP20040260262 |
申请日期 |
2004.09.07 |
申请人 |
HITACHI CHEM CO LTD |
发明人 |
ABE KOICHI;TAKAYASU REIKO;NOBE SHIGERU;ENOMOTO KAZUHIRO;SAKURAI HARUAKI |
分类号 |
C09D183/08;C09D1/00;C09D7/12;C09D183/02;C09D185/00;H01L21/312;(IPC1-7):C09D183/08 |
主分类号 |
C09D183/08 |
代理机构 |
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主权项 |
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地址 |
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