发明名称 |
FIELD-EFFECT TRANSISTOR, SENSOR USING IT, AND PRODUCTION METHOD THEREOF |
摘要 |
A sensor which has high measuring sensitivity and is excellent in response is provided by forming a porous film (106) in a sensitive section of a field-effect transistor. It comprises a porous body, which is formed on a sensitive section (here, a gate insulating film (104)) of the field-effect transistor and has cylindrical pores (195) which are formed almost perpendicularly to a substrate, and the field-effect transistor. It uses as a porous film a porous film which is made of a semiconductor material whose main component (except oxygen) is silicon, germanium, or a composite of silicon and germaninum, or a porous film made of an insulation material whose main component is silicon oxide, which has pores perpendicular to the substrate. |
申请公布号 |
WO2005015193(A1) |
申请公布日期 |
2005.02.17 |
申请号 |
WO2004JP11529 |
申请日期 |
2004.08.04 |
申请人 |
CANON KABUSHIKI KAISHA;FUKUTANI, KAZUHIKO;YONEHARA, TAKAO;MIYATA, HIROKATSU;ISHIDA, YOHEI;DEN, TOHRU |
发明人 |
FUKUTANI, KAZUHIKO;YONEHARA, TAKAO;MIYATA, HIROKATSU;ISHIDA, YOHEI;DEN, TOHRU |
分类号 |
G01N27/414;H01L29/78;H01L29/786 |
主分类号 |
G01N27/414 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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