发明名称 FIELD-EFFECT TRANSISTOR, SENSOR USING IT, AND PRODUCTION METHOD THEREOF
摘要 A sensor which has high measuring sensitivity and is excellent in response is provided by forming a porous film (106) in a sensitive section of a field-effect transistor. It comprises a porous body, which is formed on a sensitive section (here, a gate insulating film (104)) of the field-effect transistor and has cylindrical pores (195) which are formed almost perpendicularly to a substrate, and the field-effect transistor. It uses as a porous film a porous film which is made of a semiconductor material whose main component (except oxygen) is silicon, germanium, or a composite of silicon and germaninum, or a porous film made of an insulation material whose main component is silicon oxide, which has pores perpendicular to the substrate.
申请公布号 WO2005015193(A1) 申请公布日期 2005.02.17
申请号 WO2004JP11529 申请日期 2004.08.04
申请人 CANON KABUSHIKI KAISHA;FUKUTANI, KAZUHIKO;YONEHARA, TAKAO;MIYATA, HIROKATSU;ISHIDA, YOHEI;DEN, TOHRU 发明人 FUKUTANI, KAZUHIKO;YONEHARA, TAKAO;MIYATA, HIROKATSU;ISHIDA, YOHEI;DEN, TOHRU
分类号 G01N27/414;H01L29/78;H01L29/786 主分类号 G01N27/414
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