| 发明名称 |
SYSTEM AND METHOD FOR FORMING MULTI-COMPONENT DIELECTRIC FILMS |
| 摘要 |
The present invention provides systems and methods for mixing vaporized precursors such that a mixture of vaporized precursors are present together in a chamber (102) during a single pulse step in an atomic layer deposition (ALD) process to form a multi-component film. The vaporized precursors are comprised of at least two different chemical components, and such different components will form a monolayer to produce a multi-component film. In a further aspect of the invention, a dielectric film having a composition gradient is provided. |
| 申请公布号 |
WO2004105083(A3) |
申请公布日期 |
2005.02.17 |
| 申请号 |
WO2004US12245 |
申请日期 |
2004.04.21 |
| 申请人 |
AVIZA TECHNOLOGY, INC.;SENZAKI, YOSHIHIDE;PARK, SEUNG, G. |
发明人 |
SENZAKI, YOSHIHIDE;PARK, SEUNG, G. |
| 分类号 |
C23C16/02;C23C16/30;C23C16/40;C23C16/44;C23C16/455;H01L21/314;H01L21/316 |
主分类号 |
C23C16/02 |
| 代理机构 |
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