发明名称 Method for measuring overlay shift
摘要 A method for measuring overlay shift is disclosed. An image is acquired of at least one reference element that comprises at least one first pattern element in a first plane and at least one second pattern element in a second plane. An image of a measurement element is likewise acquired. The shift value between the reference element and measurement element is ascertained by comparing the image of the reference element with the image of the measurement element. An output on a user interface indicates whether a predefined tolerance value is being exceeded.
申请公布号 US2005037270(A1) 申请公布日期 2005.02.17
申请号 US20040892119 申请日期 2004.07.16
申请人 LEICA MICROSYSTEMS SEMICONDUCTOR GMBH 发明人 GERLACH STEFFEN
分类号 G03F7/20;G03F9/00;H01L21/00;(IPC1-7):G01N27/26;G03C5/00 主分类号 G03F7/20
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