发明名称 ONE-COMPONENT RESIST COMPOSITION FOR INK JET AND FORMATION METHOD OF RESIST PATTERN USING IT
摘要 <P>PROBLEM TO BE SOLVED: To provide a one-component resist composition for ink jet which is not only excellent in workability and storage stability but also excellent in pencil hardness, solvent resistance, chemical resistance and solder thermal resistance. <P>SOLUTION: The composition comprises (A) an allyl monomer having two or more allyl groups in one molecule and viscosity of 30 mPa s or less at 50&deg;C, (B) an acryloyl monomer having one or two acryloyl groups in one molecule and viscosity of 10 mPa s or less at 50&deg;C, (C) an acryloyl monomer having three or more acryloyl groups in one molecule and viscosity of 30 mPa s or less at 50&deg;C, (D) a photopolymerization initiator, (E) an antioxidant, (F) a pigment, and (G) an organic solvent. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005045116(A) 申请公布日期 2005.02.17
申请号 JP20030279201 申请日期 2003.07.24
申请人 TAIYO INK MFG LTD 发明人 MINAMOTO YOSHIZO;KAMAYACHI YUICHI
分类号 B41J2/01;B41M5/00;C09D11/00;C09D11/322;C09D11/38;H05K3/28 主分类号 B41J2/01
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