发明名称 METHOD FOR DRY-ETCHING MAGNETIC MATERIAL
摘要 PROBLEM TO BE SOLVED: To provide a dry etching method which does not need aftertreatment for corrosion and an anti-corrosion measure for an etching apparatus, and reduces such an etching damage as to deteriorate magnetic properties of a magnetic material, when etching the magnetic material by using a masking material made from a non-organic material. SOLUTION: The method for dry-etching the magnetic material comprises using an alcohol having at least one hydroxyl groups as an etching gas, forming the plasma of the etching gas, and using the masking material made from the non-organic material. When an alcohol having one hydroxyl group is used as an etching gas, the etching gas is the alcohol selected from the group consisting of methanol (CH<SB>3</SB>OH), ethanol (C<SB>2</SB>H<SB>5</SB>OH) and propanol (C<SB>3</SB>H<SB>7</SB>OH). COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005042143(A) 申请公布日期 2005.02.17
申请号 JP20030201254 申请日期 2003.07.24
申请人 ANELVA CORP 发明人 KODAIRA KICHIZO;HIROMI TAICHI
分类号 C23F4/00;G11C11/16;H01F41/30;H01L21/3065;H01L43/08;H01L43/12;(IPC1-7):C23F4/00;H01L21/306 主分类号 C23F4/00
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