发明名称 Magneto-resistive random access memory and method for manufacturing the same
摘要 A magneto-resistive random access memory includes a MOS transistor having a first gate and source and drain junctions on a substrate, a lower electrode connected to the source junction, a first magnetic layer on the lower electrode, a dielectric barrier layer including aluminum and hafnium on the first magnetic layer which, together with the first magnetic layer, form a potential well, a second magnetic layer on the dielectric barrier layer opposite the first magnetic layer, an upper electrode on the second magnetic layer, a second gate interposed between the first gate and the lower electrode to control the magnetic data of one of the first and second magnetic layers, and a bit line positioned orthogonal to the first gate and electrically connected to the upper electrode. Improved characteristics of the barrier layer increase a magnetic resistance ratio and improve data storage capacity of the magneto-resistive random access memory.
申请公布号 US2005036399(A1) 申请公布日期 2005.02.17
申请号 US20040950584 申请日期 2004.09.28
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 PARK WAN-JUN;LEE TAEK-DONG;PARK BYEONG-KOOK;KIM TAE-WAN;SONG I-HUN;PARK SANG-JIN
分类号 H01L27/105;G11C11/15;G11C11/34;H01L21/8246;H01L27/22;H01L29/82;H01L43/08;(IPC1-7):G11C11/34 主分类号 H01L27/105
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