| 摘要 |
PROBLEM TO BE SOLVED: To position and hold a substrate in a short period of time, in a substrate holding apparatus by electrostatic attraction. SOLUTION: In the substrate holding apparatus, the substrate 100 is held on a substrate holding means 1 by a predetermined status after adjusting position relation between the substrate 100 and the substrate holding means 1 in a status that the substrate 100 is retained being isolated from a substrate holding surface of the substrate holding means 1 by using a retaining member 21 which is protruded from the substrate holding surface of the substrate holding means 1. In the apparatus, the substrate holding means 1 holds the substrate 100 with a second holding force smaller than the first holding force for holding the substrate 100 by the predetermined status or with holding force of zero, before adjusting position relation between the substrate 100 and the substrate holding means 1. COPYRIGHT: (C)2005,JPO&NCIPI |
