发明名称 METHOD AND APPARATUS FOR FORMING MEMBRANE, METHOD AND APPARATUS FOR MANUFACTURING LIQUID CRYSTAL DEVICE, LIQUID CRYSTAL DEVICE, METHOD AND APPARATUS FOR MANUFACTURING MEMBRANE STRUCTURE, MEMBRANE STRUCTURE AND ELECTRONIC DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a membrane forming apparatus constituted so as not only to suppress the waste of a material by employing an ink jet coating method but also to uniformize the thickness of a membrane to be formed as a whole, a method for forming the membrane, an apparatus and a method for manufacturing a liquid crystal device, a liquid crystal device, an apparatus and a method for manufacturing a membrane structure, the membrane structure and an electronic device. SOLUTION: The membrane forming apparatus 1 is constituted so as to coat a substrate SUB with a coating solution prepared by dissolving or dispersing a membrane material in a solvent to form a membrane. This apparatus is equipped with a liquid droplet discharge means having a liquid droplet discharge head 2 for discharging the coating solution to the substrate SUB, a moving means 4 for relatively moving the liquid droplet discharge head 2 and the position of the substrate SUB and a control part C for controlling at least one of the liquid droplet discharge means and the moving means 4, and has an inert gas supply means 5 for supplying an inert gas containing vapor of at least one kind of a solvent to the vicinity of the coating solution applied to the substrate SUB. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005040688(A) 申请公布日期 2005.02.17
申请号 JP20030201684 申请日期 2003.07.25
申请人 SEIKO EPSON CORP 发明人 MORIYAMA HIDEKAZU
分类号 B41J2/01;B05C5/00;B05C11/10;B05D3/04;B05D7/00;(IPC1-7):B05C5/00 主分类号 B41J2/01
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