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发明名称
在半导体晶圆制造系统中,补偿扫描系统计时差异之方法及系统
摘要
一种半导体晶圆制造系统,包括至少一追踪系统和一扫描器系统,藉由当这样之偏离被侦测时,动态地引进时间延迟而补偿在该扫描器系统中从正常周期性之偏离。较佳地,先前技艺之静态等待状态也引进至该晶圆方法中以减少资源冲突之可能性。尽管有这样之偏离,因为维持了晶圆流程之同步,该产生之半导体晶圆制造系统可以享受增强之晶圆输出率。
申请公布号
TW200506711
申请公布日期
2005.02.16
申请号
TW093106731
申请日期
2004.03.12
申请人
ASML控股公司
发明人
希拉蕊L 何
分类号
G06F7/00
主分类号
G06F7/00
代理机构
代理人
陈长文
主权项
地址
荷兰
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