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发明名称
与薄光阻剂相结合之可湿式显影的硬掩膜以用于微光石印刷技术
摘要
提供一种使用与超薄光阻剂相结合之硬掩膜或保护层的新颖方法。在此方法中,保护层的薄膜系被覆于欲藉由反应性离子蚀刻(RIE)选择性修改的基材表面上。此保护层为光敏性与抗反射性。超薄光阻剂层系被覆于此保护层上方。此等膜之叠层系选择性地对光化辐射曝光,其波长由保护层与光阻剂层的感光度所决定。由曝光所产生在光阻剂与保护层上的潜像系以常用的硷性显影剂显影。光阻剂与下伏保护层的三维图案系藉由单一曝光与单一显影同时形成。当下伏基材藉由RIE蚀刻时,此保护层为掩蔽层而非光阻剂。
申请公布号
TW200507058
申请公布日期
2005.02.16
申请号
TW093116809
申请日期
2004.06.11
申请人
部鲁尔科学公司
发明人
孙逊运;李成红
分类号
H01L21/027;G03F7/004
主分类号
H01L21/027
代理机构
代理人
林镒珠
主权项
地址
美国
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