DEVICE AND METHOD FOR FORMING THIN-FILM, AND METHOD OF MANUFACTURING ELECTRONIC COMPONENT USING THE DEVICE

摘要

A film formation apparatus is structured such that vacuum chambers each having a plurality of film forming chambers are arranged in planes different from each other and allowed to communicate with each other through a delivery chamber with the vacuum chamber kept in vacuum, and a substrate is transferred between the vacuum chambers by a substrate delivery mechanism arranged in the delivery chambers. The structure is thus adopted, whereby the number of chambers in the film formation apparatus can be easily increased, an installation space can be reduced, and a production efficiency can be increased. <IMAGE>