发明名称 Mark detection method and unit, exposure method and apparatus, and device manufacturing method and device
摘要 In view of a specific area having a characteristic surface state in a mark-formed area or a surrounding area thereof, an area calculation unit has a window having a dimension corresponding to the specific area scan the whole measurement area in order to obtain a quantity representing a surface state based on measured signals through the window, and then, by identifying a measured signal area corresponding to the specific area based on the quantity as a function of the window's position, extracts a measured signal area corresponding to the mark. And a position calculation unit performs computation such as pattern-matching on the signal area extracted, thereby detecting the position of the mark accurately and quickly.
申请公布号 US6856931(B2) 申请公布日期 2005.02.15
申请号 US20010029864 申请日期 2001.12.31
申请人 NIKON CORPORATION 发明人 YOSHIDA KOUJI
分类号 G03F9/00;(IPC1-7):G01D1/00 主分类号 G03F9/00
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