发明名称 Optical metrology system with combined interferometer and ellipsometer
摘要 An interferometer and ellipsometer are combined in a metrology tool to measure the step height of a sample, which may include transparent layers. The metrology tool includes a shared light source that provides a light beam for an interferometer and a light beam for an ellipsometer, interferometer optics which direct the light beam for an interferometer to reflect off of a sample and ellipsometer optics which direct the light beam for an ellipsometer to reflect off a sample, and a detector element for receiving both the reflected light beam for an interferometer and the light beam for an ellipsometer. The light source may produce a single beam that is split into an interferometer and an ellipsometer beam with a beam splitter. In another embodiment, the interferometer and ellipsometer may share at least one of a polarizer, analyzer, or detector element.
申请公布号 US6856384(B1) 申请公布日期 2005.02.15
申请号 US20010016943 申请日期 2001.12.13
申请人 NANOMETRICS INCORPORATED 发明人 ROVIRA PABLO I.
分类号 G01B9/02;G01B11/06;(IPC1-7):G01B9/02 主分类号 G01B9/02
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