发明名称 Stage with two substrate buffer station
摘要 A stage used, e.g., in semiconductor fabrication, includes a two substrate buffer station and a movable chuck. The buffer station, in one embodiment is fixed, i.e., non-movable relative to the stage. In another embodiment, the support elements of the buffer station may move in unison vertically or horizontally. In another embodiment, a pair of the support elements horizontally moves toward another pair of support elements to reduce the necessary horizontal motion of the chuck. For example, an unprocessed substrate is loaded onto the top supporting elements of the buffer station, while processed substrates are unloaded from the bottom supporting element of the buffer station. The movable chuck is used to remove the unprocessed substrates from the buffer station and to place the processed substrates on the buffer station.
申请公布号 US6854948(B1) 申请公布日期 2005.02.15
申请号 US20020219569 申请日期 2002.08.15
申请人 NANOMETRICS INCORPORATED 发明人 SPADY BLAINE R.;COLBAN DAN M.;KEARNS ROBERT S.
分类号 B65G49/07;H01L21/677;H01L21/687;(IPC1-7):B65G49/07 主分类号 B65G49/07
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