发明名称 Photoacid generators for use in photoresist compositions
摘要 A photoacid compound having the following general structure:wherein n is an integer between about 1 to 4; R is selected from the group consisting of: substituted or unsubstituted C1-C12 linear or branched alkyl or alkenyl, substituted or unsubstituted araalkyl, substituted or unsubstituted aryl, substituted or unsubstituted bicycloalkyl, substituted or unsubstituted tricycloalkyl, hydrogen, alkyl sulfonic acid, substituted or unsubstituted perfluoroalkyl, the general structure F((CF2)pO)m(CF2)q- wherein p is between about 1 to 4, m is between about 0 to 3 and q is between about 1 to 4, and substituted or unsubstituted partially fluorinated alkyl, halofluoroalkyl, perfluoroalkylsulfonic, or glycidyl; and X is selected from the group consisting of: organic cations and covalently bonded organic radicals.
申请公布号 US6855476(B2) 申请公布日期 2005.02.15
申请号 US20020117693 申请日期 2002.04.05
申请人 ARCH SPECIALTY CHEMICALS, INC. 发明人 FERREIRA LAWRENCE;BLAKENEY ANDREW J.;SPAZIANO GREGORY DOMINIC;DIMOV OGNIAN;KOCAB J. THOMAS;HATFIELD JOHN P.
分类号 C07C309/10;C07C321/28;C07C323/20;C07C381/12;C07D207/40;C07D209/94;C07D333/46;G03F7/004;G03F7/039;(IPC1-7):G03F7/038;G03F7/26 主分类号 C07C309/10
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