发明名称 |
Plasma chamber cleaning |
摘要 |
A method for determining optimum plasma chamber cleaning cycles based on an electrical precursor signal. Polymer build up on the interior wall of plasma chamber 1 during normal production runs is monitored by observing the phase of the fundamental RF signal on a pre-selected baseline process. At a predetermined level of this signal, the chamber processing is stopped and the chamber walls are cleaned.
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申请公布号 |
US6855209(B2) |
申请公布日期 |
2005.02.15 |
申请号 |
US20020133081 |
申请日期 |
2002.04.26 |
申请人 |
SCIENTIFIC SYSTEMS RESEARCH LIMITED |
发明人 |
SCANLAN JOHN;O'LEARY KEVIN |
分类号 |
H01J37/32;(IPC1-7):B08B7/04 |
主分类号 |
H01J37/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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