| 摘要 |
A pattern of a transfer mask to transfer, by the use of energy beams, a transfer pattern to a substrate is disclosed, the transfer mask made by forming an aperture pattern in a thin film portion supported by a supporting frame portion. When the transfer pattern includes a shielding pattern in which one part is connected to at least the periphery of the transfer mask, a shielding pattern portion, where the ratio of the surface area of the pattern surface portion on the transfer mask to a sectional area of a supporting portion is larger than 5000, is divided and developed.
|
