发明名称 |
Method of manufacturing a thin film magnetic head |
摘要 |
A method of manufacturing a thin film magnetic head capable of improving a yield while making a pole width extremely minute with high precision is provided. A write gap layer and a bottom pole are selectively etched in a region other than a portion corresponding to a front end part through the RIE with the front end part having an extremely minute uniform width as a mask in an atmosphere of gas including at least chlorine out of chlorine and boron trichloride and at an ambient temperature within a range of 30° C. to 300° C. The width (pole width) of a pole portion can be made uniform with high precision along a length direction so that the yield of the thin film magnetic head can be improved.
|
申请公布号 |
US6854175(B2) |
申请公布日期 |
2005.02.15 |
申请号 |
US20010974815 |
申请日期 |
2001.10.12 |
申请人 |
TDK CORPORATION |
发明人 |
SASAKI YOSHITAKA |
分类号 |
G11B5/31;G11B5/39;(IPC1-7):G11B5/127;G11B5/23;C23F1/12 |
主分类号 |
G11B5/31 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|