发明名称 Method of manufacturing a thin film magnetic head
摘要 A method of manufacturing a thin film magnetic head capable of improving a yield while making a pole width extremely minute with high precision is provided. A write gap layer and a bottom pole are selectively etched in a region other than a portion corresponding to a front end part through the RIE with the front end part having an extremely minute uniform width as a mask in an atmosphere of gas including at least chlorine out of chlorine and boron trichloride and at an ambient temperature within a range of 30° C. to 300° C. The width (pole width) of a pole portion can be made uniform with high precision along a length direction so that the yield of the thin film magnetic head can be improved.
申请公布号 US6854175(B2) 申请公布日期 2005.02.15
申请号 US20010974815 申请日期 2001.10.12
申请人 TDK CORPORATION 发明人 SASAKI YOSHITAKA
分类号 G11B5/31;G11B5/39;(IPC1-7):G11B5/127;G11B5/23;C23F1/12 主分类号 G11B5/31
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