| 发明名称 |
Thermal proximity effects in lithography |
| 摘要 |
A proximity correction tool receives an indication of a feature in a lithographic design. The proximity correction tool predicts a film edge placement for the feature in a resist film based at least in part on thermal proximity effects in the resist film.
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| 申请公布号 |
US2005030495(A1) |
申请公布日期 |
2005.02.10 |
| 申请号 |
US20030638066 |
申请日期 |
2003.08.08 |
| 申请人 |
FRYER DAVID S.;SINGH VIVEK K;PHUNG THANH N. |
发明人 |
FRYER DAVID S.;SINGH VIVEK K;PHUNG THANH N. |
| 分类号 |
G03B27/32;G03F1/14;G03F7/20;(IPC1-7):G03B27/32 |
主分类号 |
G03B27/32 |
| 代理机构 |
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代理人 |
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