发明名称 RESIST REMOVING APPARATUS
摘要 <p>A resist removing apparatus capable of effectively suppressing the occurrence of foam and mist and efficiently eliminating a removed resist from the surface of a substrate, wherein a plurality of header tubes (31) extending in a substrate carrying direction are disposed on the substrate at specified intervals in the lateral direction of the substrate. Flat type spray nozzles (32) are installed on the header tubes (31) at specified intervals. The header tubes (31) are rotated in both directions in synchronism with each other at specified angles to synchronously swing the large number of flat type spray nozzles (32) in both directions with respect to the base part thereof. The plurality of flat type spray nozzles (32) on the header tubes (31) are arranged in a tube axial direction with their diffusing directions generally facing the substrate carrying direction so that resist removing fluid can be sprayed linearly along the substrate carrying direction, and tilted in the same direction at an angle theta of 30&ring;or less, desirably 15&ring;or less relative to the substrate carrying direction so that the interference of the jetting fluid can be avoided between the adjacent spray nozzles.</p>
申请公布号 WO2005013342(A1) 申请公布日期 2005.02.10
申请号 WO2004JP10117 申请日期 2004.07.15
申请人 SUMITOMO PRECISION PRODUCTS CO., LTD;SUGANAGA, DAISUKE;FUJINE, OSAMU;MIZUKAWA, SHIGERU;NAKATA, KATSUTOSHI 发明人 SUGANAGA, DAISUKE;FUJINE, OSAMU;MIZUKAWA, SHIGERU;NAKATA, KATSUTOSHI
分类号 H01L21/027;G03F7/30;G03F7/42;H01L21/00;H01L21/304;(IPC1-7):H01L21/027;G02F1/13 主分类号 H01L21/027
代理机构 代理人
主权项
地址