CHEMICAL VAPOR DEPOSITION DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a chemical vapor deposition device which further improves uniformity of a film formed on a semiconductor substrate. SOLUTION: Two reaction chambers 3 are provided to a chamber of a chemical vapor deposition device. In each of the reaction chambers 3, a shower head 5 for blowing off a material gas and an oxidant and a stage part 7 for mounting a semiconductor substrate are arranged to face each other. A lift bellows 4 is provided to a rear side of the shower head 5 circumferentially. A driving part 6 is provided above the reaction chamber 3 for driving the lift bellows 4 thereof. The distance between the shower head 5 and the stage 7 is changed by expanding or contracting the lift bellows 4 by the driving part 6. COPYRIGHT: (C)2005,JPO&NCIPI