| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an electron beam exposure device which observes a mask condition during electron beam exposure and allows an operator to easily check visually that an image of mask condition used for observation is normally updated. <P>SOLUTION: The electron beam exposure device 1 comprises an electron detector 70 for detecting reflected electrons of an electron beam 15 which scans over a mask 30, an image display 62 which displays an image 81 of the reflected electrons on a display screen 80 based on an output signal of the electron detector 70, and a display mode updating means 69 which updates a display mode of the displayed image every time the image of the reflected electrons for one display screen is displayed a prescribed number of times. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
