| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithographic equipment for a semiconductor device which controls a cost increase and reduction of yield to the minimum and can carry out lithography for a semiconductor device at high speed; and to provide a drawing method for the semiconductor device using the equipment. <P>SOLUTION: Using information obtained from the "context" of design, a figure of less importance is drawn with lower precision (but at a high speed); and even though its speed may drop significantly, the most important part is drawn by technique being able to secure sufficient precision. As a result of decision on which figure is important among them, they are classified into a plurality of levels. A predetermined level is further decided on the basis of a reference of required precision, classification into a precision higher than the predetermined level, and the precision lower than the predetermined level is carried out by data processing. If the important figure is only a small part of the whole, the method is carried out at a much higher speed, as compared with drawing the whole chip in multi-mode. The remaining figures of less importance can be drawn in a mode using fewer passes. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
