发明名称 |
METHOD AND SYSTEM FOR ION BEAM CONTAINMENT USING PHOTOELECTRONS IN AN ION BEAM GUIDE |
摘要 |
Ion implantation systems and beam containment apparatus therefor are provided in which a photoelectron source and a photon source are provided along a beam path. The photon source, such as a UV lamp, provides photons to a photoemissive material of the photoelectron source to generate photoelectrons for enhanced beam containment in the ion implantation system. |
申请公布号 |
WO2005013341(A2) |
申请公布日期 |
2005.02.10 |
申请号 |
WO2004US25310 |
申请日期 |
2004.07.30 |
申请人 |
AXCELIS TECHNOLOGIES INC.;WENZEL, KEVIN;VANDERBERG, BO |
发明人 |
WENZEL, KEVIN;VANDERBERG, BO |
分类号 |
G21K1/14;H01J37/02;H01J37/317 |
主分类号 |
G21K1/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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