| 摘要 |
<P>PROBLEM TO BE SOLVED: To provided a new iron silicide thin film and a manufacturing method thereof. <P>SOLUTION: The method of manufacturing an iron silicide thin film comprises a step of forming an iron silicide thin film on a substrate by a laser ablation method, and a step of annealing the resulted product obtained by the former step . In this case, in the iron silicide thin film, luminescence is observed by PL measurement. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
