发明名称 |
POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, SEMICONDUCTOR DEVICE, DISPLAY ELEMENT, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND DISPLAY ELEMENT |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive photosensitive resin composition which can be developed with high sensitivity without scum and gives a slightly colored film having low water absorption after curing, and to provide a method for manufacturing a semiconductor device and a display element using the same. <P>SOLUTION: The positive photosensitive resin composition contains an alkali-soluble resin (A), a diazonaphthoquinone compound (B) and a compound (C) containing -CH<SB>2</SB>OH but not containing a phenolic hydroxyl group, wherein the alkali-soluble resin (A) is preferably a polyamide resin having a specified structure and the compound (C) preferably has two or more -CH<SB>2</SB>OH groups. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
申请公布号 |
JP2005037925(A) |
申请公布日期 |
2005.02.10 |
申请号 |
JP20040184662 |
申请日期 |
2004.06.23 |
申请人 |
SUMITOMO BAKELITE CO LTD |
发明人 |
BANBA TOSHIO;HIRANO TAKASHI |
分类号 |
G03F7/037;C08G69/00;G03F7/004;G03F7/022;G03F7/039;H01L21/027 |
主分类号 |
G03F7/037 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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