发明名称 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, SEMICONDUCTOR DEVICE, DISPLAY ELEMENT, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND DISPLAY ELEMENT
摘要 <P>PROBLEM TO BE SOLVED: To provide a positive photosensitive resin composition which can be developed with high sensitivity without scum and gives a slightly colored film having low water absorption after curing, and to provide a method for manufacturing a semiconductor device and a display element using the same. <P>SOLUTION: The positive photosensitive resin composition contains an alkali-soluble resin (A), a diazonaphthoquinone compound (B) and a compound (C) containing -CH<SB>2</SB>OH but not containing a phenolic hydroxyl group, wherein the alkali-soluble resin (A) is preferably a polyamide resin having a specified structure and the compound (C) preferably has two or more -CH<SB>2</SB>OH groups. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005037925(A) 申请公布日期 2005.02.10
申请号 JP20040184662 申请日期 2004.06.23
申请人 SUMITOMO BAKELITE CO LTD 发明人 BANBA TOSHIO;HIRANO TAKASHI
分类号 G03F7/037;C08G69/00;G03F7/004;G03F7/022;G03F7/039;H01L21/027 主分类号 G03F7/037
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