In one embodiment, a solar cell (100) is fabricated using an ink pattern as a mask for a processing step. The ink pattern may comprise an ink (110) that is substantially devoid of particles that may scratch a surface on which the ink pattern is formed. The ink pattern may be formed by screen printing. In one embodiment, the ink pattern is formed on an oxide layer and comprises an ink (110) that is substantially free of silicon dioxide particles. The ink pattern may be employed as an etching or deposition mask, for example.
申请公布号
WO2005013323(A2)
申请公布日期
2005.02.10
申请号
WO2004US23200
申请日期
2004.07.19
申请人
SUNPOWER CORPORATION;CUDZINOVIC, MICHAEL, J.;KAMINAR, NEIL;PAVANI, LUCA;SMITH, DAVID, D.
发明人
CUDZINOVIC, MICHAEL, J.;KAMINAR, NEIL;PAVANI, LUCA;SMITH, DAVID, D.