| 摘要 |
FIELD: metallurgy, namely chemical and heat treatment of metals and alloys, namely ion nitriding in plasma of glow discharge, machine engineering, namely surface hardening of machine parts, possibly of complex-configuration parts, cutting tools and die fitting. ^ SUBSTANCE: at cleaning treated part in mode of cathode sputtering, pulse duration of negative voltage applied to article is discretely and successively increased by two steps at constant pulse repetition frequency. At first step pulse has width 18 - 20 ms sufficient for achieving article temperature 45 - 50°C. At second step pulse width is in range 38 - 40 ms for achieving article temperature 140 - 150°C. Then at heating in glow discharge for achieving saturation temperature, pulse width is in range 75 - 80 ms and it is sustained in such range during the whole process of saturation. ^ EFFECT: intensified cleaning process, enhanced quality of parts, especially of complex-configuration parts due to minimum arc generation at initial stage of cleaning process in mode of cathode sputtering. ^ 1 tbl, 1 ex |
