ACRYLIC POLYMERS AND RADIATION-SENSITIVE RESIN COMPOSITIONS

摘要

[PROBLEMS] To provide a resist which is excellent in the solubility in a resist solvent and little dependent on baking temperature and can form developed patterns reduced in line edge roughness. [MEANS FOR SOLVING PROBLEMS] An acrylic polymer characterized by comprising units of the general formula (1), units of general formula (2), and units of general formula (3) and/or units of general formula (4), wherein R, R', R'' and R''' are each hydrogen, methyl, or trifluoromethyl; R<1> is hydrogen, C1-4 linear or branched alkyl, alkoxy, or C1-4 linear or branched fluoroalkyl; X is a C7-20 polycyclic aliphatic hydrocarbon group consisting of carbon atoms and hydrogen atoms; R<2> and R<3> are each independently C1-4 linear or branched alkyl; R<4> is a C4-20 alicyclic hydrocarbon group; R<5> is C1-4 linear or branched alkyl; and R<6> and R<7> are each hydrogen or C1-4 linear or branched alkyl.