| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a negative photoresist composition with which good resolution is obtained in a pattern forming method in which an underlayer film is disposed on a substrate, a photoresist film comprising a negative photoresist composition is disposed on the underlayer film, and after selectively exposing the photoresist film, the underlayer film and the photoresist film are simultaneously developed. <P>SOLUTION: The negative photoresist composition contains (A) an alkali-soluble resin, (B) an acid generator which generates an acid upon irradiation with a radiation and (C) a crosslinking agent, wherein the acid generator (B) comprises an onium salt whose cation has no hydrophilic group. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
