发明名称 Semiconductor device having high withstand capacity and method for designing the same
摘要 A semiconductor device includes a semiconductor substrate, a low concentration region, an intermediate concentration region, the first electrode region, and the second electrode region. The device has a current-voltage characteristic having the first and second break points. The voltage of the first break point is equal to or smaller than that of the second break point. The device has a maximum current density when the device is applied with an electrostatic discharge surge. The current density of the first break point is smaller than the maximum current density, and the current density of the second break point is larger than the maximum current density.
申请公布号 US2005029589(A1) 申请公布日期 2005.02.10
申请号 US20040891176 申请日期 2004.07.15
申请人 DENSO CORPORATION 发明人 TAKAHASHI SHIGEKI;KAWAMOTO KAZUNORI
分类号 H01L27/04;H01L21/337;H01L21/822;H01L27/06;H01L29/08;H01L29/10;H01L29/417;H01L29/76;H01L29/78;H01L29/808;H01L29/86;H01L29/8605;H01L29/861;(IPC1-7):H01L29/76 主分类号 H01L27/04
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