| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition which hardly causes development scum, and has excellent sensitivity, resolution, and adhesiveness and excellent durability against sandblasting as a mask material for sandblasting so as to process the objective substrate into a fine pattern with high yield, to provide a photosensitive resin laminate using the composition, and to provide a surface processing method using the composition, in particular, a method for surface processing for a substrate of a plasma display. <P>SOLUTION: After a resist pattern is formed by using a photosensitive resin composition containing a polyurethane prepolymer having a propylene oxide group, an alkali-soluble polymer, an ethylenically unsaturated addition polymerizable monomer and a photopolymerization initiator, the pattern is subjected to sandblasting. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
