| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a phenol resin for positive type photoresists having good plating resistance and excellent contrasts and patterning shapes and forming a thick film. <P>SOLUTION: The phenol resin for the photoresists is represented by general formula (I) [wherein, R<SB>1</SB>s are each selected from a 1-5C alkylene group; R<SB>2</SB>s are each selected from a hydrogen, a hydroxy group and a 1-4C alkyl group; n is an integer of 1-3; R<SB>2</SB>s when the n is ≥2 may be each the same or different; and the ratio of x and y is x:y=(1:99) to (80:20)]. The phenol resin for the photoresists has 500-30,000 weight-average molecular weight expressed in terms of polystyrene. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
