FOREIGN SUBSTANCE REMOVING DEVICE, SUBSTRATE PROCESSING EQUIPMENT AND SUBSTRATE PROCESSING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a foreign substance removing device which fully removes foreign substances on the surface of a substrate, substrate processing equipment having the device and a substrate processing method.

SOLUTION: The substrate processing equipment includes an ashing portion and cleaning treatment portions MPC1, MPC2. The cleaning treatment portions MPC1, MPC2 have a spin chuck 21 for keeping the substrate W after ashing to be horizontal and for rotating the substrate W around a vertical rotating axis passing through the center of the substrate W. A two fluid nozzle 50 is provided above the spin chuck 21. The two fluid nozzle 50 mixes treated liquid such as pure water, resist stripper or the like with nitrogen gas to generate a mixed fluid, and feeds it to a surface of the substrate W.

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