发明名称 Lithographic projection apparatus and device manufacturing method
摘要 A lithographic projection apparatus is disclosed where at least part of a space between a projection system of the apparatus and a substrate is filled with a liquid by a liquid supply system. The projection system is separated into two separate physical parts. With substantially no direct connection between the two parts of the projection system, vibrations induced in a first of the two parts by coupling of forces through the liquid filling the space when the substrate moves relative to the liquid supply system affects substantially only the first part of the projection system and not the other second part.
申请公布号 US2005030498(A1) 申请公布日期 2005.02.10
申请号 US20040890389 申请日期 2004.07.14
申请人 ASML NETHERLANDS B.V. 发明人 MULKENS JOHANNES CATHARINUS HUBERTUS
分类号 G03F7/20;H01L21/027;(IPC1-7):G03B27/52 主分类号 G03F7/20
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