发明名称 System for and method of manufacturing a large-area backplane by use of a small-area shadow mask
摘要 A vapor deposition shadow mask system includes a number of series connected vacuum vessels each having a material deposition source and shadow mask positioned therein. A substrate is translated along a path that has a longitudinal axis that extends through the vacuum vessels. Centers of shadow masks in first and second vacuum vessels are offset laterally on opposite sides of the longitudinal axis. The system is operative for deposition material on a second area of the substrate via the material deposition source and shadow mask in the second vacuum vessel in a manner that overlaps a portion of the material deposited on a first, adjacent area of the substrate via the material deposition source and shadow mask in the first vacuum vessel.
申请公布号 US2005031783(A1) 申请公布日期 2005.02.10
申请号 US20040925726 申请日期 2004.08.25
申请人 ADVANTECH GLOBAL, LTD 发明人 BRODY THOMAS PETER;MALMBERG PAUL R.
分类号 C23C14/04;C23C14/56;H01L21/77;H01L21/84;H01L27/12;H01L27/32;H01L51/56;(IPC1-7):C23C16/00 主分类号 C23C14/04
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