发明名称 METHOD OF MANUFACTURING 3-5 GROUP COMPOUND SEMICONDUCTOR
摘要 <P>PROBLEM TO BE SOLVED: To provide a method of improving the light-emitting property of a 3-5 group compound semiconductor when the semiconductor is temporarily taken out from a reactor and then grown again in the reactor. <P>SOLUTION: In the method of improving the light-emitting property of the 3-5 group compound semiconductor, a 3-5 group compound has a semiconductor layer not doped with a p-type dopant and a semiconductor layer doped with the p-type dopant and is expressed by a general formula of In<SB>x</SB>Ga<SB>y</SB>Al<SB>z</SB>N (x + y + z = 1, 0 &le; x &le; 1, 0 &le; y &le; 1, 0 &le; z &le; 1). In this method, (1) the former semiconductor layer is first grown in the reactor by using metal-organic chemical vapor deposition, (2) the semiconductor layer is taken out from the reactor, and after a while, (3) the semiconductor layer is put into the reactor or a reactor different from the reactor to grow the latter semiconductor layer on the former semiconductor layer. In this manufacturing, before the latter semiconductor layer is grown, (4) the former semiconductor layer is held in an atmosphere of ammonia at 500 to 1300 &deg;C. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005039237(A) 申请公布日期 2005.02.10
申请号 JP20040184622 申请日期 2004.06.23
申请人 SUMITOMO CHEMICAL CO LTD 发明人 IECHIKA YASUSHI;ONO YOSHINOBU;TAKADA TOMOYUKI;SHIMIZU SEIYA
分类号 H01L21/205;H01L33/06;H01L33/32 主分类号 H01L21/205
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