PATTERN DRAWING APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a pattern drawing apparatus and method, and an optical jig where the laser beams of uniform and intense distribution are generated.

SOLUTION: A laser beam L1 fetched from laser equipment 1a enters a condenser lens 3 after reflected by mirrors 2a and 2b. A laser beams L2 fetched from laser equipment 1b also enters the condenser lens 3. The two laser beams are condensed nearly to the same spot and enter a glass rod 4 made of quartz. In the glass rod 4, the total reflection of the laser beams is repeated like in an optical fiber. A laser beam L3 emitted from the glass rod 4 has very uniform spatial intensity distribution. The laser beam L3 enters a projection optical system 5 to irradiate a mirror device 8. A laser beam L5 having entered a micro mirror corresponding to a drawing pattern enters a projection lens 9 like a laser beam L6. The lens 9 projects the pattern on the mirror device 8 in the drawing area 11 of the substrate 10.

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