| 发明名称 |
Method of controlling removal of photoresist in openings of a photoresist mask |
| 摘要 |
A method of controlling removal of photoresist in openings of a photoresist mask has the steps of obtaining in a scanning electron microscope a video signal of a bottom of an opening of a photoresist mask, and comparing values of the video signal in different points of an image which contains the opening to be controlled.
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| 申请公布号 |
US2005032004(A1) |
申请公布日期 |
2005.02.10 |
| 申请号 |
US20030633602 |
申请日期 |
2003.08.04 |
| 申请人 |
NIKITIN ARKADY;YEREMIN DMITRIY |
发明人 |
NIKITIN ARKADY;YEREMIN DMITRIY |
| 分类号 |
G03F7/00;G03F7/30;(IPC1-7):G03F7/00 |
主分类号 |
G03F7/00 |
| 代理机构 |
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