发明名称 Optical semiconductor device including InGaAlAs doped with Zn
摘要 A modulation doped multiple quantum well structure having a steep Zn profile of several nm by the balance between an increase in a Zn concentration and a decrease in Zn diffusion by using metal organic vapor phase epitaxy using Zn, in which an InGaAlAs quaternary alloy is used and the Zn concentration and the range for crystal composition are defined to equal to or less than the critical concentration at which Zn diffuses abruptly in each of InGaAlAs compositions.
申请公布号 US6853015(B2) 申请公布日期 2005.02.08
申请号 US20020173753 申请日期 2002.06.19
申请人 HITACHI, LTD. 发明人 TSUCHIYA TOMONOBU
分类号 H01S5/343;H01L21/205;H01S5/22;H01S5/223;H01S5/227;H01S5/30;H01S5/34;(IPC1-7):H01L31/032;H01L31/033;H01L31/072;H01L31/109;H01L35/26 主分类号 H01S5/343
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