发明名称 Semiconductor device fabrication method and semiconductor device fabrication apparatus
摘要 A method of manufacturing a semiconductor device able to reduce the number of manufacturing steps and attain the rationalization of a manufacturing line is disclosed. The semiconductor device is a high-frequency module assembled by mounting chip parts (22) and semiconductor pellets (21) onto each of wiring substrates (2) formed on a matrix substrate (27) after inspection. A defect mark (2e) is affixed to a wiring substrate (2) as a block judged to be defective in the inspection of the matrix substrate (27), then in a series of subsequent assembling steps the defect mark (e) is recognized and the assembling work for the wiring substrate (2) with the defect mark (2e) thereon is omitted to attain the rationalization of a manufacturing line.
申请公布号 US6852553(B2) 申请公布日期 2005.02.08
申请号 US20020129305 申请日期 2002.05.03
申请人 RENESAS TECHNOLOGY CORP. 发明人 ISHIZU AKIO;TAKASHIMA KAZUTOSHI;OBA SHIRO;KOBAYASHI YOSHIHIKO;IDA TSUTOMU;HAGA SHIGERU;TAKADA SUSUMU;KOUJIRO IWAMICHI;ARAI NORINAGA;KAKEGAWA YUJI
分类号 G01R31/26;H01L21/50;H01L21/58;H01L21/66;H01L21/98;H01L23/04;H01L23/10;H01L23/13;H01L23/498;H01L23/50;H01L23/544;H01L25/16;(IPC1-7):H01L21/00;H01L21/44 主分类号 G01R31/26
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