Positive resist composition

摘要

A positive resist composition comprising:(A) a fluorine group-containing resin having: a structure wherein at least one of the main chain and the side chain of the polymer skeleton has at least one fluorine atom; and having a group capable of decomposing under the action of an acid to increase the solubility in an alkali developer;(B) a compound capable of generating an acid upon irradiation with one of actinic ray and radiation, and(C) a surfactant containing at least one of a silicon atom and a fluorine atom.