| 摘要 |
PURPOSE: A wafer processing apparatus capable of mapping wafers is provided to prevent dusts generated in a wafer processing apparatus from contaminating the wafer. CONSTITUTION: A first sensor(9a) determines whether a wafer is on a table. A mapping frame(5) supports the first sensor(9a). A conveyor supports the first sensor(9a) to enable the sensor to be movable in a vertical direction along the mapping frame when the sensor is inserted in a box. A timing plate includes indexing units spaced from one another with a predetermined distance. A second sensor(9b) is formed between the indexing units. Signals with respect to each of the tables are generated by the second sensor(9b) and the timing plate when the sensor is moved in the vertical direction.
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