METHOD AND APPARATUS FOR PREDICTING PHOTOLITHOGRAPHY PROCESS AND METHOD AND APPARATUS FOR MONITORING PHOTOLITHOGRAPHY PROCESS TO PREVIOUSLY DETERMINE POSSIBILITY OF ABNORMAL PHOTOLITHOGRAPHY PROCESS AND CHECK ABNORMALITY OF PHOTORESIST PATTERN FORMED ON SEMICONDUCTOR SUBSTRATE IN REAL TIME

摘要

PURPOSE: An apparatus for predicting a photolithography process is provided to previously determine the possibility of an abnormal photolithography process and check abnormality of a photoresist pattern formed on a semiconductor substrate in real time by using reflectivity of an ARC(anti-reflective coating) formed on the semiconductor substrate. CONSTITUTION: Before a photolithography process is performed, an optical characteristic measuring part(110) measures an optical characteristic of a semiconductor substrate to determine the possibility of abnormality of the semiconductor substrate in the photolithography process. A data process part(130) determines the possibility of abnormality of the semiconductor substrate by using the result of the measurement data of the optical characteristic measured by the optical characteristic measuring part.