发明名称 PRECISE CROSS-SECTIONAL SAMPLE FABRICATION APPARATUS FOR ANALYZING FAILURE OF DEVICE USING SILICON SUBSTRATE FOR CUTTING ONLY DESIRED PART
摘要 PURPOSE: A precise cross-sectional sample fabrication apparatus for analyzing a failure of a device using a silicon substrate is provided to cut only a desired part by using a cleavage plane characteristic of a silicon wafer to apply stress. CONSTITUTION: A precise cross-sectional sample fabrication apparatus for analyzing a failure of a device using a silicon substrate includes a cutting tip(108) for executing a cutting operation by using a cleavage plane characteristic of the silicon substrate. The precise cross-sectional sample fabrication apparatus further include a cutting handle(106), a microscope barrel(104), a handle(102) for controlling a focus, and a V-groove sample holder(110) having a fixing clip for fixing the silicon substrate.
申请公布号 KR20050013832(A) 申请公布日期 2005.02.05
申请号 KR20030052410 申请日期 2003.07.29
申请人 MAGNACHIP SEMICONDUCTOR, LTD. 发明人 PARK, SUNG KUN
分类号 H01L21/66;(IPC1-7):H01L21/66 主分类号 H01L21/66
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