GAS SUPPLY APPARATUS OF ION IMPLANTATION INCREASING ION GENERATING EFFICIENCY DUE TO COLLISION WITH MORE THERMIONS BY DISTRIBUTING OVER MORE WIDER RANGE

摘要

PURPOSE: A gas supply apparatus of an ion implantation is provided to divide an introducing portion of a gas inlet pipe into two pipes. CONSTITUTION: An introducing portion of a gas inlet pipe(20) connected with a arc chamber(10) is divided into a first and second inlet pipes(21,22) in order to enlarge the distribution range of source gas. The first inlet pipe is connected with a portion located at the side opposite to a filament(11). the second inlet pipe is connected with a portion adjacent to the filament.