| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a mask frame etc., that protects a mask and is improved in the reproducibility of the position of the mask when the mask is attached to and removed from the frame. <P>SOLUTION: The mask frame 20 has upper and lower plates 21 and 23 which are clamped with screws 25. The mask 10 is held between a reference-side mask holding pad 33 of the lower plate 23 and a mask holding pad 31 provided on the bottom surface of the upper plate 21. The mask 10 is restricted on the top surface of the reference-side mask holding pad 33 by means of three mask positioning pins 35 including a notch retaining pin 35-1 in a notch 11. At central parts of the plates 21 and 23, windows (openings) 27 and 29 are opened to make electron beams pass through. At the time of inspecting a pattern position and performing exposure, the mask 10 is held by an inspection device or an exposure device while the mask 10 is held by the mask frame 20. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
