发明名称 METHOD FOR PRODUCING NANO-DEVICE USING POTENTIAL SINGULAR POINT ON SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a method for producing a bottom-up type nano-device, which initiates a reaction from a potential singular point on a substrate, and regularly arranges compound molecules so as to accelerate a chain reaction utilizing the arranging pattern. SOLUTION: This method for producing the nano device comprises a production process of the potential singular point for placing the potential singular point on a substrate, and a contact process for bringing the compound molecules having a functional group which interacts with the potential singular point into contact with the substrate having the potential singular point. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005028540(A) 申请公布日期 2005.02.03
申请号 JP20030272567 申请日期 2003.07.09
申请人 NATIONAL INSTITUTE OF INFORMATION & COMMUNICATION TECHNOLOGY 发明人 TANAKA HIDEYOSHI;SUZUKI HITOSHI;UEKADO TOSHIYA;MASUKO NOBURO
分类号 B82B3/00;C25D1/18;(IPC1-7):B82B3/00 主分类号 B82B3/00
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