发明名称 |
METHOD FOR PRODUCING NANO-DEVICE USING POTENTIAL SINGULAR POINT ON SUBSTRATE |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for producing a bottom-up type nano-device, which initiates a reaction from a potential singular point on a substrate, and regularly arranges compound molecules so as to accelerate a chain reaction utilizing the arranging pattern. SOLUTION: This method for producing the nano device comprises a production process of the potential singular point for placing the potential singular point on a substrate, and a contact process for bringing the compound molecules having a functional group which interacts with the potential singular point into contact with the substrate having the potential singular point. COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2005028540(A) |
申请公布日期 |
2005.02.03 |
申请号 |
JP20030272567 |
申请日期 |
2003.07.09 |
申请人 |
NATIONAL INSTITUTE OF INFORMATION & COMMUNICATION TECHNOLOGY |
发明人 |
TANAKA HIDEYOSHI;SUZUKI HITOSHI;UEKADO TOSHIYA;MASUKO NOBURO |
分类号 |
B82B3/00;C25D1/18;(IPC1-7):B82B3/00 |
主分类号 |
B82B3/00 |
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